High sensitivity:high performance imaging system with high NA and low aberration are adopted.
Process adaptability:Wide spectrum light source and polarization can be added, which has good process adaptability for FinFET process.
Superior CoO:Ultra-precision high-speed motion platformare coupledwith high performance measurement method.
User-friendly: Automatic measurement mode selection and automatic prescription generation are available, so that prescription generation time ca n greatly saved.
Factory automation: It supportsSECS/GEM SEMI standard, which can fully meet the requirements of factory automation.